The Precision 5000® is a single-wafer, multi-chamber platform for sequential wafer processing. The platform supports sequential processing of wafers ranging in size from 4", 5", 6", or 8".
The platform supports up to 4 separate process chambers. Wafers are processed in a low vacuum environment.
The multi-chamber design of this platform allows for individual processes in each of the four chambers.
The following chamber types can be added to the system:
Lamp Heated CVD - Processes include: SACVD, BWCVD, WCVD, TEOS, Nitride
PE TEOS DxZ - DxZ chamber design for better process control for Plasma Enhanced TEOS applications.
PE Silane DxZ - DxZ chamber design for better process control for Plasma Enhanced Silane based applications.
Tungsten WxZ - Tungsten deposition chamber designed for zero edge exclusion. Available with ceramic heater option.
WxP Tungsten Etch (HeWeb)- Tungsten etch back chamber with electrostatic chuck or ceramic clampd process kit, depending on process.
ASP - Advanced Strip Passivation (ASP) chamber used to remove photo resist and passivate the wafer.
ASP+ - Advanced Strip Passivation+ (ASP+) chamber used to remove photo resist and passivate the wafer.
Oxide MxP+ - Dielectric etch chamber.
Poly Etch MxP - Reactive Ion Etch chamber used for etching Polysilicon films.
Poly Etch MxP+ - Reactive Ion Etch chamber used for etching Polysilicon films.
R2 Metal Etch - Reactive Ion Etch chamber used for etching Metal films.
Metal Etch MxP - Reactive Ion Etch chamber used for etching Metal films.
Mark II Etch - Used for Sputter etch or Reactive Ion Etching.
Orienter - Findes center of the wafer for proper placement. Notch/flat aligns the wafer.
Single Slot Cooldown - Utilizes a water cooled pedestal to cool the wafer when placed in the chamber. Wafers do not contact the pedestal.
Single Slot Contact Cooldown - Utilizes a water cooled pedestal to cool the wafer when placed in the chamber. Wafers contact the pedestal, allowing for faster cooling, and higher throughput.
Multi-Slot Cooldown - Cools up to eight wafers simultaneously in a water cooled cassette elevator.
